The interactions of gaseous oxygen and different types of polycrystall
ine titanium surfaces were studied at room temperature within the expo
sure range of 0-1000 L. Combined measurements utilizing direct recoils
spectrometry (DRS), Auger electron spectroscopy (AES), X-ray photoele
ctron spectroscopy (XPS), and work function variations enabled the dis
tinction between processes occurring on the topmost atomic layer and t
hose associated with subsurface incorporation of oxygen. Also, the dif
ferent chemical forms (oxidation states) developing during the exposur
e course were identified. The results were compared for three types of
surfaces, each prepared by a different cleaning procedure. It has bee
n concluded that: (i) Oxygen initially accumulates on the topmost atom
ic layer, regardless of the type of the studied surface. No preferred
subsurface occupation has been observed. (ii) The kinetics of initial
accumulation (up to a complete surface coverage) are similar for all t
he different types of surfaces. (iii) Mixtures of different oxidation
states of titanium (0, +2, +3, +4) are present during the whole course
of exposure. Qualitatively, increasing proportions of the higher vale
nce states are displayed for higher oxygen exposures. However, the qua
ntitative estimates of their relative amounts indicate a strong depend
ence on the type of surface, with preferred high oxidation (+4) states
obtained for high temperature annealed samples (as compared with room
temperature sputtered surfaces). (iv) Topmost oxygen atoms which term
inate the oxides surfaces are less negatively charged than the underly
ing (i.e., subsurface) ''oxidic'' atoms. These results may account for
some of the controversies presented in the literature.