CHARACTERISTICS OF SILICON OXIDATION-KINE TICS DURING LASER-EMISSION OF MEDIUM IR-RANGE

Authors
KHOVIV AM NAZARENKO IN DUBOV SI
Citation
Am. Khoviv et al., CHARACTERISTICS OF SILICON OXIDATION-KINE TICS DURING LASER-EMISSION OF MEDIUM IR-RANGE, Zurnal fiziceskoj himii, 69(4), 1995, pp. 755-756
Citations number
4
Categorie Soggetti
Chemistry Physical
Journal title
Zurnal fiziceskoj himii → ACNP
ISSN journal
00444537
Volume
69
Issue
4
Year of publication
1995
Pages
755 - 756
Database
ISI
SICI code
0044-4537(1995)69:4<755:COSOTD>2.0.ZU;2-O