MICROFABRICATION OF COMPLEX SURFACE TOPOGRAPHIES USING GREY-TONE LITHOGRAPHY

This paper reports on a study of a methodology for fabrication of reli ef shaped microstructures using technologies common to standard IC man ufacturing processes. Particular emphasis is put on the design and use of halftone transmission masks for the lithography step required in t he fabrication process of mechanical, optical or electronic components . The design and experimental investigation of grey-tone masks is supp orted by lithography simulation. Results are presented for both, simul ated grey-tone patterns as well as experimental profiles.