PHOTOLITHOGRAPHIC STRUCTURING OF GIANT MAGNETORESISTIVE CO-CU MULTILAYERS

Authors
BARTSCH W RUPP G SCHELTER W
Citation
W. Bartsch et al., PHOTOLITHOGRAPHIC STRUCTURING OF GIANT MAGNETORESISTIVE CO-CU MULTILAYERS, Sensors and actuators. A, Physical, 46(1-3), 1995, pp. 302-306
Citations number
9
Categorie Soggetti
Engineering, Eletrical & Electronic","Instument & Instrumentation
Journal title
Sensors and actuators. A, Physical → ACNP
ISSN journal
09244247
Volume
46
Issue
1-3
Year of publication
1995
Pages
302 - 306
Database
ISI
SICI code
0924-4247(1995)46:1-3<302:PSOGMC>2.0.ZU;2-9
Abstract
A manufacturing process for structuring giant magnetoresistive multila yers based on dry etching techniques is described. The samples were de posited on oxidized silicon with the sensitive areas varying in width between 5 and 100 mu m. The structured multilayers exhibited magnetic properties in accordance with unstructured macroscopic control samples of 100 mm(2) total area.