MAGNETIZATION PROCESSES IN SPUTTERED CO-CR-TA THIN-FILMS PREPARED BY TRANSFER DEPOSITION

Sputtered Co-Cr-Ta thin films have been produced using the transfer de position technique. Their remanence properties have been investigated in directions parallel and transverse to the transfer direction as a f unction of magnetic film thickness between 20 and 100 nm. The variatio n in the remanence properties with magnetic film thickness is differen t in the two directions and is attributed to a complex combination of dipolar and exchange interactions. Current modelling studies cannot di stinguish between the effects of-the interaction types and an extensio n of modelling studies is proposed.