STUDIES OF COATING AND ETCHING PROCESS OF JD RESIN WITH XPS

The etching process of JD resins studied with XPS shows that benzene r ings accumulated on the surface more than in the body, The amount of g roups such as C-OH, C=O, C-SO3H and COOH introduced into the surface d uring etching increased with the increase of temperature or the prolon ging of the time, and the content of every groups is calculated. The a brasion-resistance coating after being solidified has SiO2 structure. The priority etching condition for JD resins is at 20 degrees C kept f or 20 min, so that the adhesion strength of the coating is increased w hile the light transmittance of the substrate is not decreased obvious ly.