GROWTH AND STRUCTURE OF COPPER THIN-FILMS DEPOSITED ON (0001) SAPPHIRE BY MOLECULAR-BEAM EPITAXY

Citation
G. Dehm et al., GROWTH AND STRUCTURE OF COPPER THIN-FILMS DEPOSITED ON (0001) SAPPHIRE BY MOLECULAR-BEAM EPITAXY, Philosophical magazine. B. Physics of condensed matter. Structural, electronic, optical and magnetic properties, 71(6), 1995, pp. 1111-1124
Citations number
21
Categorie Soggetti
Physics, Applied
ISSN journal
09586644
Volume
71
Issue
6
Year of publication
1995
Pages
1111 - 1124
Database
ISI
SICI code
0958-6644(1995)71:6<1111:GASOCT>2.0.ZU;2-7
Abstract
The structure of copper films grown on (0001) sapphire by molecular be am epitaxy at 200 degrees C and 600 degrees C was studied by in situ r eflection high-energy electron diffraction (RHEED) and transmission el ectron microscopy (TEM). Both RHEED and TEM confirm that growth is epi taxial at 200 degrees C, but {111}(Cu) textured at 600 degrees C. Howe ver, in both instances growth occurs with the copper (111) plane paral lel-to the interface. In the case of the 200 degrees C films the close -packed directions of copper lie parallel to the close-packed directio ns of sapphire in the interfacial plane; these films contain low angle grain boundaries with the interface normal to the axis of rotation. H igh resolution and atomic resolution electron microscopy of the interf ace viewed in cross-section suggest that the atomic structure of the c opper/sapphire interface is incoherent. The textured growth at 600 deg rees C and near single crystal growth at 200 degrees C are explained i n terms of entropy contributions to the free energy of the Cu/Al2O3 in terface.