We have studied the nitriding of titanium by direct laser irradiation,
in a nitrogen atmosphere. Two kinds of laser were used : a TEA-CO2 em
itting in IR at 10.6 mu m and a XeCl excimer emitting in UV at 308nm.
The power density was in the range 20-80 MW/cm(2). In order to relate
the caracteristics of the plasma created on the target with the film p
roperties, we have performed surface analyses on the samples. The pres
ence of titanium nitride, oxynitride (TiNxOy) and oxyde (TiO2) is evid
enced. The use of the XeCl laser seems to promote the nitriding proces
s against oxydation.