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ITA
ENG
VUV SOURCE FOR PHOTOCHEMICAL DEPOSITION O F THIN DIELECTRIC FILMS
Authors
NISSIM YI
FLICSTEIN J
VITEL Y
DULAC O
DEBAUCHE C
LICOPPE C
Citation
Yi. Nissim et al., VUV SOURCE FOR PHOTOCHEMICAL DEPOSITION O F THIN DIELECTRIC FILMS, Annales de physique, 19(5), 1994, pp. 229-236
Citations number
11
Categorie Soggetti
Physics
Journal title
Annales de physique
→
ACNP
ISSN journal
00034169
Volume
19
Issue
5
Year of publication
1994
Supplement
S
Pages
229 - 236
Database
ISI
SICI code
0003-4169(1994)19:5<229:VSFPDO>2.0.ZU;2-D