INFLUENCE OF DEPOSITION TEMPERATURE ON THE SUPERCONDUCTIVITY OF Y1-XHOXBA2CU3O7-DELTA FILMS PRODUCED BY DC-MAGNETRON SPUTTERING

Experimental results of research on the influence of deposition temper ature (T-s) on crystal structure and superconductivity of Y1-xHOxBa2Cu 3O7-delta (YHBCO) films deposited by dc-magnetron sputtering are repor ted. X-ray diffraction analysis showed that the films grew with prefer ential orientation of the c-axis normal to the substrate surface in th e range of temperature 750-820 degrees C. The single-crystal structure of the YHBCO films grown epitaxially at the optimal substrate tempera tures of 820, 800, 760, and 750 degrees C, respectively, have been est ablished by rocking curves, Phi-scan, and electron channeling pattern (ECP). Typical values of the critical current density (A . cm(-2)) at 77 K and 0.1 T field are 2.1 x 10(5), 4 x 10(5), 6.2 x 10(5), and 3.1 x 10(5) for the x = 0, 0.2, 0.4, 0.7 films respectively, measured by a Quantum Design magnetrometer (H parallel to c).