KINETICS OF LASER-INDUCED REACTION OF GE( 111) WITH CL-2 UNDER LASER IRRADIATION AT 1064 NM

Authors
Citation
Kz. Zhang et Qz. Qin, KINETICS OF LASER-INDUCED REACTION OF GE( 111) WITH CL-2 UNDER LASER IRRADIATION AT 1064 NM, Gaodeng xuexiao huaxue xuebao, 16(4), 1995, pp. 599-602
Citations number
11
Categorie Soggetti
Chemistry
ISSN journal
02510790
Volume
16
Issue
4
Year of publication
1995
Pages
599 - 602
Database
ISI
SICI code
0251-0790(1995)16:4<599:KOLROG>2.0.ZU;2-F
Abstract
Laser-induced gas-surface reaction of Ge(lll) surface with chlorine is investigated by a CW supersonic molecular beam under a pulsed laser i rradiation at 1064 nm. A major desorbed reaction product GeCl2 is dete rmined at different surface temperatures by a time-resolved mass spect rometry. The reaction yield of GeCl2 increases obviously with increasi ng the translational energy of the incident chlorine molecules, laser fluence and surface temperature. But the translational temperature of GeCl2 measured by time-of-flight spectra are independent of incident C l-2 tanslational energy and laser fluence. A possible reaction mechani sm for the laser-induced reaction of Ge(lll) with Cl-2 at 1064 nm main ly consists of the dissociative chemisorption of Cl-2 on the surface, the reaction of absorbed Cl with Ge atoms and the laser-induced therma l desorption.