SI- A PRETREATMENT METHOD FOR DIAMOND NUCLEATION ON A SI WAFER( IMPLANTATION )

Authors
YANG J SU XW CHEN QJ LIN ZD
Citation
J. Yang et al., SI- A PRETREATMENT METHOD FOR DIAMOND NUCLEATION ON A SI WAFER( IMPLANTATION ), Applied physics letters, 66(24), 1995, pp. 3284-3286
Citations number
20
Categorie Soggetti
Physics, Applied
Journal title
Applied physics letters → ACNP
ISSN journal
00036951
Volume
66
Issue
24
Year of publication
1995
Pages
3284 - 3286
Database
ISI
SICI code
0003-6951(1995)66:24<3284:SAPMFD>2.0.ZU;2-C