ALL IN-SITU DEPOSITION AND CHARACTERIZATION OF YBA2CU3O7-X THIN-FILMSBY LOW-ENERGY ION-SCATTERING SPECTROSCOPY

Authors
NAKAMURA T TANAKA S IIYAMA N
Citation
T. Nakamura et al., ALL IN-SITU DEPOSITION AND CHARACTERIZATION OF YBA2CU3O7-X THIN-FILMSBY LOW-ENERGY ION-SCATTERING SPECTROSCOPY, Applied physics letters, 66(24), 1995, pp. 3362-3364
Citations number
15
Categorie Soggetti
Physics, Applied
Journal title
Applied physics letters → ACNP
ISSN journal
00036951
Volume
66
Issue
24
Year of publication
1995
Pages
3362 - 3364
Database
ISI
SICI code
0003-6951(1995)66:24<3362:AIDACO>2.0.ZU;2-V