PARTICLE CONTAMINATIONS IN LPCVD POLYSILICON

Particle contamination of poly-Si films deposited in an LPCVD system w as investigated by using the orthogonal array L8 experiment. Gas injec tion, temperature, pressure and flow rate were used as variable factor s. The surfaces of samples were analysed by using SEM and AFM. Results indicated that the construction of the gas injection was the key para meter to suppress particle formation. Applying a multiple-hole injecto r at the back of the tube reduced these surface defects.