THE EFFECT OF SELF-IONS BOMBARDMENT ON THE STRUCTURE AND PROPERTIES OF THIN METAL-FILMS

Metal films were deposited by the partially ionized beam technique, us ing a source with high ionization efficiency. Some characteristics of the source were investigated. Metals with low, medium and high melting temperatures were used for deposition. If was found that ionization e fficiency of low-melting metals is higher than that of metals with med ium and high-melting temperatures. The effect of the amount of self-io ns in the beam of a deposited material as well as the effect of their energy on the structure and properties of the resulting films were stu died.