AUTOMATIC MASK ALIGNMENT WITHOUT A MICROSCOPE

Authors
KANJILAL AK NARAIN R SHARMA R CHITNIS VT SINGH BP LIU JN YAMADA J UCHIDA Y
Citation
Ak. Kanjilal et al., AUTOMATIC MASK ALIGNMENT WITHOUT A MICROSCOPE, IEEE transactions on instrumentation and measurement, 44(3), 1995, pp. 806-809
Citations number
11
Categorie Soggetti
Engineering, Eletrical & Electronic","Instument & Instrumentation
Journal title
IEEE transactions on instrumentation and measurement → ACNP
ISSN journal
00189456
Volume
44
Issue
3
Year of publication
1995
Pages
806 - 809
Database
ISI
SICI code
0018-9456(1995)44:3<806:AMAWAM>2.0.ZU;2-F
Abstract
A novel method for automatic mask alignment without using a microscope is reported. This method relies on the moire technique, and alignment marks are used in the form of gratings. The alignment is done in two steps with coarse and fine pitch gratings, The mask-to-wafer placement accuracy is estimated to be +/-40 mu m. The mask alignment accuracy w ith present experimental conditions is demonstrated to be better than +/-50 mm. New alignment marks for the actual mask aligner are also pro posed.