NOVEL PLASMA CHEMICAL TECHNOLOGIES - PPCP AND SPCP FOR CONTROL OF GASEOUS-POLLUTANTS AND AIR TOXICS

Citation
S. Masuda et al., NOVEL PLASMA CHEMICAL TECHNOLOGIES - PPCP AND SPCP FOR CONTROL OF GASEOUS-POLLUTANTS AND AIR TOXICS, Journal of electrostatics, 34(4), 1995, pp. 415-438
Citations number
NO
Categorie Soggetti
Engineering, Eletrical & Electronic
Journal title
ISSN journal
03043886
Volume
34
Issue
4
Year of publication
1995
Pages
415 - 438
Database
ISI
SICI code
0304-3886(1995)34:4<415:NPCT-P>2.0.ZU;2-F
Abstract
The pulse corona induced plasma chemical process (PPCP) and the surfac e discharge induced plasma chemical process (SPCP) represent novel tec hnologies for generating copious active radicals under ordinary temper ature and pressure for control of gaseous pollutants (NO(x), SO(x), VO Cs) and air toxics (Hg and other readily vaporized metals, trichloroet hane, trichloroethylene, freons, toluene, dioxines, etc.) as well as o dors. PPCP and SPCP are completely dry processes having a simple const ruction, and their overall cost (both initial and running) is one of t he lowest among the processes for control of gaseous pollutants. They can be combined with a wet ESP, a bag-filter with absorbent powder coa t, a catalyst bed, or an active charcoal bed for the final removal of the reaction products.