Ee. Farndon et al., EFFECT OF THIOUREA, BENZOTRIAZOLE AND 4,5-DITHIAOCTANE-1,8-DISULFONICACID ON THE KINETICS OF COPPER DEPOSITION FROM DILUTE-ACID SULFATE-SOLUTIONS, Journal of Applied Electrochemistry, 25(6), 1995, pp. 574-583
The effects of thiourea (TU), benzotriazole (BTA) and 4,5-dithiaoctane
-1,8-disulphonic acid (DTODSA) on the deposition of copper from dilute
acid sulphate solutions have been studied using potential sweep techn
iques. Tafel slopes and exchange current densities were determined in
the presence and absence of these organic additives. TU and BTA were f
ound to inhibit the copper deposition reaction; increases in the BTA c
oncentration gave a systematic lowering of the exchange current densit
y, whilst TU behaved in a less predictable manner. For BTA and TU conc
entrations of 10(-5) mol dm(-3), j(0) values of 0.0027 +/- 0.0001 and
0.0028 +/- 0.0002 mA cm(-2) were obtained compared to a value of 0.008
3 +/- 0.0003 mAcm(-2) for the additive free acid sulphate solution. In
contrast, in the presence of DTODSA, an increased exchange current of
0.043 +/- 0.0003 mA cm(-2) was observed. The presence of additives ga
ve rise to measured Tafel slopes of - 164, -180 and -190 mV for TU, BT
A and DTODSA, respectively, compared to that of -120 mV for copper sul
phate alone.