Y. Bu et Mc. Lin, THE ADSORPTION AND THERMAL-DECOMPOSITION OF CH2CO (CD2CO) ON SI(111)-7X7, Journal of the Chinese Chemical Society, 42(2), 1995, pp. 309-316
The adsorption and thermal decomposition of ketene on Si(111)-7 x 7 we
re investigated using various surface analysis techniques. When the su
rface was exposed to ketene at 120 K, two CO stretching modes at 220 a
nd 273 meV appeared in HREELS, corresponding to two adsorbed ketene st
ates. After the sample was annealed at similar to 250 K, the 273 and t
he 80 meV peaks vanished, indicating the disappearance of one of the a
dsorption states by partial desorption of the adsorbate. In a correspo
nding TPD measurement, a desorption peak for ketene species was noted
at 220 K. Annealing the sample at 450 K caused the decomposition of th
e adsorbate, producing CHx and O adspecies. Further annealing of the s
urface at higher temperatures resulted in the breaking of the CH bond,
the desorption of H and O species and the formation of Si carbide. Th
e desorption of H at 800 K was confirmed by the appearance of the D-2
(m/e = 4) TPD peak at that temperature when CD2CO was used instead of
CH2CO.