By using Photothermal Deflection Spectroscopy(PDS), the optical absorp
tion was measured in amorphous silicon-carbon alloys. The Urbach energ
y E(0) and defect density N-D were deduced in the films. The samples w
ere prepared by the technique of Plasma Enhanced Chemical Vapor Deposi
tion(PECVD) from silane (SiH4) and methane (CH4). Two series of sample
s were studied. The first one was prepared by varying the pressure fro
m 0.35 to 0.7 mbar in deposition chamber and for which we find a decre
ase of E(0) when E(g) increases, while the defect density is unchanged
. The second serie was made by dilution in hydrogen. The effect of dil
ution is to reduce considerably E(0) and N-D in the material.