RBS ANALYSIS OF PHOSPHORUS-GETTERING OF GOLD AND COPPER IN SILICON

Citation
B. Hartiti et al., RBS ANALYSIS OF PHOSPHORUS-GETTERING OF GOLD AND COPPER IN SILICON, Annales de chimie, 19(7-8), 1994, pp. 483-486
Citations number
19
Categorie Soggetti
Chemistry,"Material Science
Journal title
ISSN journal
01519107
Volume
19
Issue
7-8
Year of publication
1994
Pages
483 - 486
Database
ISI
SICI code
0151-9107(1994)19:7-8<483:RAOPOG>2.0.ZU;2-K
Abstract
In this work, we will present results showing that Rutherford Back-Sca ttering (RBS) is particularly efficient to study the extrinsic getteri ng of Au and Cu by phosphorus diffusion in a classical or rapid therma l furnace. We have found bu RBS measurement that an accumulation of Au and Cu in the phosphorus doped region is clearly evidenced after clas sical or rapid thermal diffusion of phosphorus from a spin-on deposite d silicon glass source in the temperature range 950-1050 degrees C for typical durations of 15 min and 25 sec respectively, confirming the e xistence of a classical as well as a rapid thermal gettering effect.