THERMAL-BEHAVIOR OF DEEP LEVELS CORRELATED WITH IRON IN SILICON METAL-OXIDE-SEMICONDUCTOR STRUCTURE

Authors
KISHINO S IWAMOTO S YOSHIDA H NIU H MATSUDA T
Citation
S. Kishino et al., THERMAL-BEHAVIOR OF DEEP LEVELS CORRELATED WITH IRON IN SILICON METAL-OXIDE-SEMICONDUCTOR STRUCTURE, Journal of applied physics, 77(5), 1995, pp. 2199-2201
Citations number
12
Categorie Soggetti
Physics, Applied
Journal title
Journal of applied physics → ACNP
ISSN journal
00218979
Volume
77
Issue
5
Year of publication
1995
Pages
2199 - 2201
Database
ISI
SICI code
0021-8979(1995)77:5<2199:TODLCW>2.0.ZU;2-G