BREAKDOWN CHARACTERISTICS IN INP INGAAS AVALANCHE PHOTODIODE WITH P-I-N MULTIPLICATION LAYER STRUCTURE/

Authors
Citation
Ks. Hyun et Cy. Park, BREAKDOWN CHARACTERISTICS IN INP INGAAS AVALANCHE PHOTODIODE WITH P-I-N MULTIPLICATION LAYER STRUCTURE/, Journal of applied physics, 81(2), 1997, pp. 974-984
Citations number
33
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
81
Issue
2
Year of publication
1997
Pages
974 - 984
Database
ISI
SICI code
0021-8979(1997)81:2<974:BCIIIA>2.0.ZU;2-7
Abstract
We report on the breakdown voltages in InP/InGaAs avalanche photodiode (APD) experimentally and theoretically, based on the parameters of el ectric field distribution, carrier concentrations, thicknesses, and te mperatures. According to the calculation, the breakdown voltage has it s minimum point, w(0), at each carrier concentration in charge plate a nd avalanche photodiode with very thin multiplication layer width will provide high gain bandwidth product. The devices having different mul tiplication layer width showed different breakdown voltages and temper ature behaviors. We introduced newly defined temperature coefficient, gamma, and found that gamma's are linearly dependent on breakdown volt ages at each temperature. From these results, the empirical formula wh ich effectively describes the temperature dependence of breakdown volt ages was obtained. (C) 1997 American Institute of Physics.