DEPTH PROFILING IN SURFACES USING TOTAL-REFLECTION X-RAY-FLUORESCENCE

Only three types of specimens can be applied for calibration in TXRF, namely pure particle-, film- or bulk-type samples. In this study ''dro plet'' standards, as a representative of the particle type, and ''spin -drying'' standards, for film-type samples were examined and compared with a pure metal standard (bulk-type). A test procedure is described which makes it possible to detect faulty calibration samples. An itera tive data processing technique is presented which extracts layer chara cteristics and-to a certain extent-depth profiles from TXRF data as a function of the incident angle. Two selected examples are considered, a Fe-Ti-Fe thin-layer system and an implantation profile of Ni-atoms i n silicon. Based on these samples, the capability and limitations of T XRF for depth profiling are discussed.