POWER DEPOSITION IN HIGH-DENSITY INDUCTIVELY-COUPLED PLASMA TOOLS FORSEMICONDUCTOR PROCESSING

Authors
JAEGER EF BERRY LA TOLLIVER JS BATCHELOR DB
Citation
Ef. Jaeger et al., POWER DEPOSITION IN HIGH-DENSITY INDUCTIVELY-COUPLED PLASMA TOOLS FORSEMICONDUCTOR PROCESSING, Physics of plasmas, 2(6), 1995, pp. 2597-2604
Citations number
15
Categorie Soggetti
Phsycs, Fluid & Plasmas
Journal title
Physics of plasmas → ACNP
ISSN journal
1070664X
Volume
2
Issue
6
Year of publication
1995
Part
2
Pages
2597 - 2604
Database
ISI
SICI code
1070-664X(1995)2:6<2597:PDIHIP>2.0.ZU;2-7