2-DIMENSIONAL MODEL OF REACTIVE GAS-FLOW IN A DIAMOND FILM CVD-REACTOR

Citation
Ya. Mankelevich et al., 2-DIMENSIONAL MODEL OF REACTIVE GAS-FLOW IN A DIAMOND FILM CVD-REACTOR, DIAMOND AND RELATED MATERIALS, 4(8), 1995, pp. 1065-1068
Citations number
7
Categorie Soggetti
Material Science
ISSN journal
09259635
Volume
4
Issue
8
Year of publication
1995
Pages
1065 - 1068
Database
ISI
SICI code
0925-9635(1995)4:8<1065:2MORGI>2.0.ZU;2-K
Abstract
A two-dimensional model of the reactive gas flow, heat transfer and el ectrodynamic phenomena in a d.c. discharge reactor for diamond film de position has been developed. Contrary to earlier proposed models we ca lculate the electron-molecule reaction rate coefficients by solving th e Boltzmann equation for the electron energy distribution function. Th ese coefficients are used for chemical gas composition calculations. A n effective numerical method for solving the chemical kinetics equatio ns has been developed. The electric field strength was determined from the total current conservation condition and the electron balance equ ation. The spatial distributions and fluxes of the chemical species an d the gas flow parameters have been obtained as a result of the self-c onsistent calculations.