STUDY OF THE PRODUCTION OF CR-NI-AL SPUTT ERING TARGETS BY VACUUM PLASMA SPLAYING

Cr-Ni-Al sputtering targets are required for tile production of thin f ilms with special electrical resistivity The investigations were inten ded to test in principle the possibility to produce Cr-Ni-Al sputterin g targets by the method of vacuum plasma spraying. Therefore a lot of spraying tests were carried out, and subsequently the coatings were an alysed by observing the microstructure, measuring the hardness and X-r aying. Mixtures of individual metal powders with different particle si ze were used as spraying materials. The results yielded that tile form ation of an intermetallic Al-Ni phase during the spraying process has to be prevented by an intensively cooling of the substrate as well os limiting the plasma power. The Cr-Ni-Al sputtering targets produced by this method were successfully tested in a dc-magnetron equipment.