Rr. Speth et al., INFLUENCE OF THE HIGH-VOLTAGE PULSE-SHAPE ON THE PLASMA SOURCE ION-IMPLANTATION PROCESS, Applied physics letters, 65(18), 1994, pp. 2272-2274
Using a two fluid model, we investigate the effects on the ion impact
energy, of varying the shape of a large, negative, finite rise time, v
oltage pulse to a planar target. Two pulse shapes are tested, one with
exponential shutoff, and one with a powered linear shutoff. For pulse
lengths under 50 mu s, we find that pulse shaping can be used to make
moderate changes in the energy distribution of the implanted ions. Fo
r pulse lengths over 50 mu s, there is a negligible difference in the
ion impact energy distribution for the pulse shapes tested. (c) 1994 A
merican Institute of Physics.