INFLUENCE OF THE HIGH-VOLTAGE PULSE-SHAPE ON THE PLASMA SOURCE ION-IMPLANTATION PROCESS

Using a two fluid model, we investigate the effects on the ion impact energy, of varying the shape of a large, negative, finite rise time, v oltage pulse to a planar target. Two pulse shapes are tested, one with exponential shutoff, and one with a powered linear shutoff. For pulse lengths under 50 mu s, we find that pulse shaping can be used to make moderate changes in the energy distribution of the implanted ions. Fo r pulse lengths over 50 mu s, there is a negligible difference in the ion impact energy distribution for the pulse shapes tested. (c) 1994 A merican Institute of Physics.