Local structural information has been obtained from extended x-ray-abs
orption fine-structure measurements on samples of porous silicon produ
ced under various conditions, and these have been correlated with phot
oluminescence emission and excitation spectra. The x-ray near-edge str
ucture (XANES) shows the existence of a feature in between those assig
ned to Si-Si and Si-O bonding. Laser-induced mass analysis indicates t
hat the presence of various silicon hydroxides correlates strongly wit
h the strength of this peak. In addition, although porous silicon cons
ists of a surface whose roughness is of the order of nm, it has been p
ossible to obtain depth-profiling reflected x-ray-absorption fine stru
cture (REFLEXAFS) and reflectivity from some samples. The REFLEXAFS XA
NES again shows the additional feature, the strength of which increase
s with the intensity of the Si-Si peak, that is, with depth.