X-RAY PHOTOELECTRON DIFFRACTION STUDY OF YBAS GAAS(001) AND SCAS/GAAS(001) HETEROSTRUCTURES/

Citation
B. Lepine et al., X-RAY PHOTOELECTRON DIFFRACTION STUDY OF YBAS GAAS(001) AND SCAS/GAAS(001) HETEROSTRUCTURES/, Journal of applied physics, 76(9), 1994, pp. 5218-5224
Citations number
24
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
76
Issue
9
Year of publication
1994
Pages
5218 - 5224
Database
ISI
SICI code
0021-8979(1994)76:9<5218:XPDSOY>2.0.ZU;2-E
Abstract
Polar angle distributions of core level photoemission intensities reco rded on YbAs/GaAs(001) and ScAs/GaAs(001) heterostructures are present ed. They allow first the surface roughness of thin YbAs overlayers to be seen, second to estimate the tetragonal distortion of a strained Sc As film and, third, the most interesting point, to demonstrate in a di rect fashion that the mixed (Yb-As) (010) planes of YbAs grow in the p rolongation of the As planes of GaAs. The results are compared to thos e obtained by other authors with various techniques. The main advantag e of the photoelectron diffraction method over the other techniques is that it can be performed on very thin epitaxial films (some monolayer s) directly in situ under ultrahigh vacuum.