EFFECT OF BIAS ANNEALING ON AU N-SI SCHOTTKY-BARRIER WITH HYDROGEN INCORPORATION/

Citation
Mh. Yuan et al., EFFECT OF BIAS ANNEALING ON AU N-SI SCHOTTKY-BARRIER WITH HYDROGEN INCORPORATION/, Journal of applied physics, 76(9), 1994, pp. 5592-5594
Citations number
17
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
76
Issue
9
Year of publication
1994
Pages
5592 - 5594
Database
ISI
SICI code
0021-8979(1994)76:9<5592:EOBAOA>2.0.ZU;2-W
Abstract
The Au/n-Si Schottky barrier (SB) which contains hydrogen has a 0.10 e V lower SB height (SBH) than that without hydrogen. For the hydrogen-c ontaining SB, zero bias annealing (ZBA) decreases the SBH while revers e bias annealing (RBA) increases it. In addition, ZBA and RBA cycling experiments have been made which reveal a reversible change of the SBH within at least four cycles. The annealing temperature of ZBA and esp ecially of RBA influences the SBH. We interpret the above effect in te rms of an interaction between hydrogen and metal-semiconductor interfa ce states.