SOLID-STATE CHARACTERIZATION OF POLYSILANES CONTAINING THE SIH BOND

Organosilicon hydride polymers show promise for high performance photo resist, dielectric, and optical coating applications. In this report w e describe the solid-state characterization of these silicon-based pol ymers prepared by reductive condensation and plasma polymerization met hods. The combination of high resolution solid-state NMR, infrared, an d Rutherford backscattering spectroscopies provides a quantitative des cription of the polymer microstructure. As a result of these studies t he effects of polymerization conditions on polymer microstructure can be more readily determined and optimized.