ESCA, NEXAFS AND AFM ANALYSIS OF A DC OXYGEN PLASMA-TREATED ORGANIC-MODEL ADHEREND

Authors
UNGER WES LIPPITZ A WOLL C FRIEDRICH JF NICK L
Citation
Wes. Unger et al., ESCA, NEXAFS AND AFM ANALYSIS OF A DC OXYGEN PLASMA-TREATED ORGANIC-MODEL ADHEREND, Le Vide, les couches minces, (272), 1994, pp. 95-98
Citations number
5
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
Journal title
Le Vide, les couches minces → ACNP
ISSN journal
02234335
Issue
272
Year of publication
1994
Supplement
S
Pages
95 - 98
Database
ISI
SICI code
0223-4335(1994):272<95:ENAAAO>2.0.ZU;2-I
Abstract
A self-assembling octadecyltrichlorsilane (CH3(CH2)(17)SiCl3, ''OTS'') film was deposited on an oxidized silicon wafer, carefully exposed to a law pressure oxygen dc. plasma and covered with Cr in the sub-monol ayer range. The different states of the sample were characterized empl oying XPS, NEXAFS and AFM. Information on the oxygen functionalization , the development of the molecular conformation and surface topography and the first step of metal film formation are obtained