A single-electron memory, in which a bit of information is stored by o
ne electron, is demonstrated at room temperature, The memory is a floa
ting gate metal-oxide-semiconductor transistor in silicon with a chann
el width (similar to 10 nanometers) smaller than the Debye screening l
ength of a single electron and a nanoscale polysilicon dot (similar to
7 nanometers by 7 nanometers) as the floating gate embedded between t
he channel and the control gate, Storing one electron on the floating
gate screens the entire channel from the potential on the control gate
and leads to (i) a discrete shift in the threshold voltage, (ii) a st
aircase relation between the charging voltage and the shift, and (iii)
a self-limiting charging process. The structure and fabrication of th
e memory should be compatible with future ultralarge-scale integrated
circuits.