ABSOLUTE RATE CONSTANTS FOR ATOMIC FLUORINE IN SOLUTION - CHARACTERIZATION OF REACTION INTERMEDIATES IN THE LASER FLASH-PHOTOLYSIS OF XENONDIFLUORIDE

Citation
G. Bucher et Jc. Scaiano, ABSOLUTE RATE CONSTANTS FOR ATOMIC FLUORINE IN SOLUTION - CHARACTERIZATION OF REACTION INTERMEDIATES IN THE LASER FLASH-PHOTOLYSIS OF XENONDIFLUORIDE, Journal of the American Chemical Society, 116(22), 1994, pp. 10076-10079
Citations number
19
Categorie Soggetti
Chemistry
ISSN journal
00027863
Volume
116
Issue
22
Year of publication
1994
Pages
10076 - 10079
Database
ISI
SICI code
0002-7863(1994)116:22<10076:ARCFAF>2.0.ZU;2-U
Abstract
Laser flash photolysis of xenon difluoride in 1,1,2-trichlorotrifluoro ethane (Freon-113) yields atomic fluorine, which can be detected via i ts loose complex with the solvent. This complex, with an absorption ma ximum at 320 nm, has a lifetime at ambient temperature of about 200 ns and is quenched with rate constants near the diffusion controlled lim it by most substrates. In neat hexafluorobenzene as solvent, the hepta fluorocyclohexadienyl radical is observed. In addition to the fluorine atom, a second species formed with lambda(max) = 345 nm is assigned t o be the XeF radical, with a lifetime of ca. 25 mu s in acetonitrile a t ambient temperature.