PREPARATION OF LA-MODIFIED LEAD TITANATE THIN-FILMS BY RF-MAGNETRON SPUTTERING METHOD AND THEIR PYROELECTRIC PROPERTIES

Citation
T. Kamada et al., PREPARATION OF LA-MODIFIED LEAD TITANATE THIN-FILMS BY RF-MAGNETRON SPUTTERING METHOD AND THEIR PYROELECTRIC PROPERTIES, JPN J A P 2, 34(2B), 1995, pp. 233-235
Citations number
8
Categorie Soggetti
Physics, Applied
Volume
34
Issue
2B
Year of publication
1995
Pages
233 - 235
Database
ISI
SICI code
Abstract
High-quality La-modified lead titanate (PLT) films were grown on MgO s ubstrates by an rf-magnetron sputtering method. In this method, interm ittent deposition was realized by periodical repetition of deposition and non-deposition processes with rotation of the substrate holder. Th e difference between intermittent and continuous methods was examined in terms of the crystal structure and the pyroelectric properties of t he films. Intermittent deposition was found to enhance the horizontal grain growth of the films. Excellent PLT films with a high pyroelectri c coefficient of 5.0 x 10(-8) C/cm(2) . K and low dielectric constant of 185 were reproducibly obtained by this method.