Ds. Wills et al., A 3-DIMENSIONAL HIGH-THROUGHPUT ARCHITECTURE USING THROUGH-WAFER OPTICAL INTERCONNECT, Journal of lightwave technology, 13(6), 1995, pp. 1085-1092
This paper presents a three-dimensional, highly parallel, optically in
terconnected system to process high-throughput stream data such as ima
ges, The vertical optical interconnections are realized using integrat
ed optoelectronic devices operating at wavelengths to which silicon is
transparent. These through-wafer optical signals are used to vertical
ly optically interconnect stacked silicon circuits, The thin film opto
electronic devices are bonded directly to the stacked layers of silico
n circuitry to realize self-contained vertical optical interconnection
s. Each integrated circuit layer contains analog interface circuitry,
namely, detector amplifier and emitter driver circuitry, and digital c
ircuitry for the network and/or processor, all of which are fabricated
using a standard silicon integrated circuit foundry, These silicon ci
rcuits are post processed to integrate the thin him optoelectronics us
ing standard, low cost, high yield microfabrication techniques. The th
ree-dimensionally integrated architectures described herein are a netw
ork and a processor. The network has been designed to meet off-chip I/
O using a new offset cube topology coupled with naming and routing sch
emes, The performance of this network is comparable to that of a three
-dimensional mesh, The processing architecture has been defined to min
imize overhead for basic parallel operations, The system goal for this
research is to develop an integrated processing node for high-through
put, low-memory applications.