PROCESSING-INDUCED RESISTIVE BARRIERS IN ZNO VARISTOR MATERIAL

Authors
Citation
Dc. Halls et C. Leach, PROCESSING-INDUCED RESISTIVE BARRIERS IN ZNO VARISTOR MATERIAL, Journal of Materials Science, 30(11), 1995, pp. 2733-2737
Citations number
19
Categorie Soggetti
Material Science
ISSN journal
00222461
Volume
30
Issue
11
Year of publication
1995
Pages
2733 - 2737
Database
ISI
SICI code
0022-2461(1995)30:11<2733:PRBIZV>2.0.ZU;2-7
Abstract
Evidence is presented for the origin of high-resistivity barriers at c ertain interfaces in high-field varistor materials. The barriers give rise to terrace contrast which can be observed using remote electron b eam induced current imaging in the SEM. It is proposed that these inte rfaces, which are often associated with a thick intergranular layer of a compositionally distinct bismuth rich oxide, are relicts of the pow der structure and correspond to agglomerate surfaces. It is suggested that the presence of these resistive surfaces ultimately limits the cu rrent that can flow at breakdown.