SYNTHESIS OF CARBON NITRIDE FILMS BY MAGNETICALLY ROTATED ARC-PLASMA JET CHEMICAL-VAPOR-DEPOSITION

Authors
Citation
Ty. Yen et Cp. Chou, SYNTHESIS OF CARBON NITRIDE FILMS BY MAGNETICALLY ROTATED ARC-PLASMA JET CHEMICAL-VAPOR-DEPOSITION, Solid state communications, 95(5), 1995, pp. 281-286
Citations number
29
Categorie Soggetti
Physics, Condensed Matter
Journal title
ISSN journal
00381098
Volume
95
Issue
5
Year of publication
1995
Pages
281 - 286
Database
ISI
SICI code
0038-1098(1995)95:5<281:SOCNFB>2.0.ZU;2-P
Abstract
Carbon Nitride films have been grown on nickel substrates by magnetica lly rotated arc-plasma jet chemical vapor deposition (CVD). These film s were characterized by scanning electron microscopy (SEM), wavelength dispersive X-ray spectrometry (WDS) transmission electron microscopy (TEM), and Raman spectroscopy. Small grains (similar to 0.1 mu m) as w ell as nanocrystallites found in the films were identified to be beta- C3N4. Raman spectrum also confirmed the existence of beta-C3N4 phase i n the films through three pronounced Raman bands at low frequency as e xpected from the Hooke's law approximation.