The layered structure of GaSe makes it suitable for the technique of V
an der Waals epitaxy, a molecular beam deposition technique where hete
rostructures are fabricated based on a property of interest and are no
t limited by lattice and thermal expansion mismatch. Single crystal Ga
Se has been grown on GaAs(111)A by vacuum sublimation from a single Ga
Se source without terminating the GaAs surface dangling bonds prior to
deposition. Mass spectroscopy was used to determine the composition o
f the molecular source. It was found that GaSe sublimates stoichiometr
ically to form Ga2Se and Se-2. This results in free selenium (Se-2) in
the molecular beam which can terminate the dangling bonds at the GaAs
surface prior to bulk GaSe growth. X-ray photoelectron spectroscopy a
nd reflection high energy electron diffraction studies of the depositi
on confirm this termination process and the structure of subsequent Ga
Se growth.