THE PREPARATION OF AMORPHOUS SIXGEYOZ ALLOY-FILMS BY SPUTTERING - PREPARATION CONDITIONS, CHEMICAL-COMPOSITION, AND VIBRATIONAL PROPERTIES

Citation
M. Zacharias et al., THE PREPARATION OF AMORPHOUS SIXGEYOZ ALLOY-FILMS BY SPUTTERING - PREPARATION CONDITIONS, CHEMICAL-COMPOSITION, AND VIBRATIONAL PROPERTIES, Physica status solidi. b, Basic research, 189(2), 1995, pp. 409-416
Citations number
32
Categorie Soggetti
Physics, Condensed Matter
ISSN journal
03701972
Volume
189
Issue
2
Year of publication
1995
Pages
409 - 416
Database
ISI
SICI code
0370-1972(1995)189:2<409:TPOASA>2.0.ZU;2-Q
Abstract
Amorphous SixGeyOx alloy films with x = 0.17 to 0.60, y = 0.19 to 0.68 , and z = 0.11 to 0.42 are deposited using reactive de magnetron sputt ering in an Ar/water atmosphere. The alloy concentrations are measured by secondary neutral mass spectrometry (SNMS). The oxygen content str ongly decreases with decreasing silicon concentration. The dependence of the alloy composition on the target coverage with germanium pieces is investigated. IR transmission measurements in the range from 400 to 4000 cm(-1) show a predominance of the Si-O-Si asymmetric stretching mode. The minor absorption band due to Ge-O-Ge stretching vibrations t otally disappears after annealing the film at 800 degrees C. An increa se of the Si-O-Si absorption mode is detected.