KINETICS OF PHOSPHORUS PROXIMITY RAPID THERMAL-DIFFUSION USING SPIN-ON DOPANT SOURCE FOR SHALLOW JUNCTIONS FABRICATION

Citation
Pb. Grabiec et al., KINETICS OF PHOSPHORUS PROXIMITY RAPID THERMAL-DIFFUSION USING SPIN-ON DOPANT SOURCE FOR SHALLOW JUNCTIONS FABRICATION, Journal of applied physics, 78(1), 1995, pp. 204-211
Citations number
43
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
78
Issue
1
Year of publication
1995
Pages
204 - 211
Database
ISI
SICI code
0021-8979(1995)78:1<204:KOPPRT>2.0.ZU;2-A