SUBSTRATE-TEMPERATURE EFFECT ON THE STABILITY OF HYDROGENATED AMORPHOUS-SILICON FILMS DEPOSITED AT HIGH-RATES

Authors
KLEIDER JP LONGEAUD C BARRANCODIAZ M MORIN P CABARROCAS PRI
Citation
Jp. Kleider et al., SUBSTRATE-TEMPERATURE EFFECT ON THE STABILITY OF HYDROGENATED AMORPHOUS-SILICON FILMS DEPOSITED AT HIGH-RATES, Journal of applied physics, 78(1), 1995, pp. 317-320
Citations number
12
Categorie Soggetti
Physics, Applied
Journal title
Journal of applied physics → ACNP
ISSN journal
00218979
Volume
78
Issue
1
Year of publication
1995
Pages
317 - 320
Database
ISI
SICI code
0021-8979(1995)78:1<317:SEOTSO>2.0.ZU;2-S