SPATIALLY-VARIABLE REACTION IN THE FORMATION OF ANODICALLY GROWN POROUS SILICON STRUCTURES

Authors
TESCHKE O DOSSANTOS MC KLEINKE MU SOARES DM GALVAO DS
Citation
O. Teschke et al., SPATIALLY-VARIABLE REACTION IN THE FORMATION OF ANODICALLY GROWN POROUS SILICON STRUCTURES, Journal of applied physics, 78(1), 1995, pp. 590-592
Citations number
17
Categorie Soggetti
Physics, Applied
Journal title
Journal of applied physics → ACNP
ISSN journal
00218979
Volume
78
Issue
1
Year of publication
1995
Pages
590 - 592
Database
ISI
SICI code
0021-8979(1995)78:1<590:SRITFO>2.0.ZU;2-Q