PULSED-SHEATH ION DYNAMICS IN A TRENCH

Plasma ion dynamics following the application of a negative voltage pu lse to a two-dimensional trench geometry are computed using a two-flui d model. The potential structure in the sheath both focuses and bunche s ions, creating an ion density pulse that travels down the sidewall o f the trench. It may be possible to exploit this phenomenon to improve ion implantation in the sidewalls of trenches and holes when using pl asma source ion implantation.