Plasma ion dynamics following the application of a negative voltage pu
lse to a two-dimensional trench geometry are computed using a two-flui
d model. The potential structure in the sheath both focuses and bunche
s ions, creating an ion density pulse that travels down the sidewall o
f the trench. It may be possible to exploit this phenomenon to improve
ion implantation in the sidewalls of trenches and holes when using pl
asma source ion implantation.