THE STUDIES OF HIGH-TEMPERATURE INTERACTION OF NB-TIO2 THIN-FILMS WITH OXYGEN

Authors
RADECKA M REKAS M
Citation
M. Radecka et M. Rekas, THE STUDIES OF HIGH-TEMPERATURE INTERACTION OF NB-TIO2 THIN-FILMS WITH OXYGEN, Journal of physics and chemistry of solids, 56(8), 1995, pp. 1031-1037
Citations number
51
Categorie Soggetti
Physics, Condensed Matter",Chemistry
Journal title
Journal of physics and chemistry of solids → ACNP
ISSN journal
00223697
Volume
56
Issue
8
Year of publication
1995
Pages
1031 - 1037
Database
ISI
SICI code
0022-3697(1995)56:8<1031:TSOHIO>2.0.ZU;2-T
Abstract
The kinetics of oxygen interaction with Nb-doped TiO2 thin films were studied within the temperature range 900-1300 K. The equilibration tim e is rather long, of the order of several hours. Such slow kinetics in dicates that the rate of equilibrium may be governed by the chemical d iffusion. The effects of the film thickness on the kinetics were also studied. It has been postulated that the motion of cation vacancies is responsible for the bulk diffusion process in material studied. The c hemical diffusion coefficient and its temperature dependence were dete rmined.