UV-SENSITIVE POLYARYLATES AS PHOTORESIST AND NONLINEAR OPTICS MATERIALS

New UV-sensitive polyarylates derived from UV-sensitive and UV-insensi tive bisphenols and phthaloyl chlorides are described. It has been fou nd that the polyarylates from bis(3-ethoxy-4-hydroxybenzylidene)aceton e and bis(4hydroxyphenyl)dichloroethylene have in particular superior properties. Other UV-sensitive polyarylates based on 2,2-bis(3-allyl-4 -hydroxyphenyl)propane and isophthaloyl chloride have also been develo ped. The main requirements for photoresists are fulfilled by these lat ter materials. These polyarylates have undergone preliminary tests to explore their uses in non-linear optics.