J. Farhoomand et al., CHARACTERIZATION OF HIGH-PURITY GAAS FAR-INFRARED PHOTOCONDUCTORS, International journal of infrared and millimeter waves, 16(6), 1995, pp. 1051-1064
In this paper we report the results of an extensive study on the far-i
nfrared photoconductivity of high purity n-type GaAs. The crystal, whi
ch was grown at Max-Plank-Institute for Solid State Physics using liqu
id-phase epitaxy, exhibited the fine structures of the excited state t
ransitions of the residual shallow level impurities. The major peak in
the spectral response belongs to the 1s-2p transition, with its respo
nsivity about thirty five times higher than the continuum. At 3.4K det
ector temperature, 625 mV bias, and 100 Hz chopping frequency the dete
ctor responsivity at 35.4 cm(-1) (279 mu m) was measured to be 0.017 A
/W. Under these same conditions, the NEP was 5.9x10(-14) W/root Hz. Th
e (DC) dark current at 25 mV bias was 5.6x10(-14) A.