SIO2 DEPOSITION FROM OXYGEN SILANE PULSED HELICON DIFFUSION PLASMAS

Authors
CHARLES C BOSWELL RW KUWAHARA H
Citation
C. Charles et al., SIO2 DEPOSITION FROM OXYGEN SILANE PULSED HELICON DIFFUSION PLASMAS, Applied physics letters, 67(1), 1995, pp. 40-42
Citations number
7
Categorie Soggetti
Physics, Applied
Journal title
Applied physics letters → ACNP
ISSN journal
00036951
Volume
67
Issue
1
Year of publication
1995
Pages
40 - 42
Database
ISI
SICI code
0003-6951(1995)67:1<40:SDFOSP>2.0.ZU;2-9