D. Carnal et al., IN-SITU STM INVESTIGATION OF TL AND PB UNDERPOTENTIAL DEPOSITION ON CHEMICALLY POLISHED AG(111) ELECTRODES, Electrochimica acta, 40(10), 1995, pp. 1223-1235
In-situ STM was used to investigate the adlayer formation and structur
e of Tl adsorbates at chemically polished Ag(111) electrodes in perchl
orate electrolyte, and to study the effect of extended I polarization
of incomplete Tl and Pb adlayers at high initial adsorbate coverage. I
n-the Tl+/Ag(111) system, the full first monolayer adsorbate has a hex
agonally close packed structure with interatomic distances that are co
mpressed in comparison with the bulk Tl phase. The subsequently formed
second monolayer has also a hexagonally close packed (hcp) structure,
but shows more pronounced disordered domains. Incomplete first Tl mono
layers of high coverage have the same hcp structure as a complete mono
layer, but do not extend to the very boundary of the substrate terrace
. Extended polarization of such monolayers leads to a conversion of th
e original hcp layer into a coverage with [root 3 x root 3]R30 degrees
-symmetry which is interpreted as a mixed coverage, where every third
Ag atom is replaced by a Tl atom. Similar phenomena are observed durin
g long-time polarization of an incompletely formed, Pb-coverage. The r
esults are discussed with regard to the role of the atomic steps and r
eveal the importance of surface singularities for the understanding of
the adsorption behaviour at real electrodes.